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Amorphous carbon films in direct current magnetron sputtering from regenerative sooting discharge

机译:非晶碳膜在直流磁控溅射中的应用   再生烟尘放电

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摘要

We present results of carbon coatings on metal substrates in cylindricalhollow cathode (CHC) direct current magnetron sputtering. This is a newtechnique of making amorphous carbon film in CHC magnetron sputtering fromregenerative sooting discharge. The carbon films are deposited on Cu and Alsubstrates in Ne atmosphere and compared with the films of carbon soot on thesame materials produced from conventional arc discharge between graphiteelectrodes at 80 Angstrom in He background. The films are characterized usingonline emission, Raman, and Fourier transform infrared spectroscopy; X-raydiffraction (XRD) and Scanning electron microscopy (SEM). Raman spectroscopyreveals the existence of graphite and diamond like structures from arcdischarge while in CHC magnetron sputtering, graphite like structures aredominant. XRD pattern from arc discharge show precipitates of Al4C3 ofrhombohedral and hexagonal types in nanometer ranges for aluminum sample andprobable formation of diamond and hexagonal carbon in copper whilst inmagnetron sputtering we get amorphous carbon films. SEM images of surface showcollection of loose agglomerates of carbon particles in arc discharge whereasfor magnetron sputtering structures are regular with smooth edges and finegrains.
机译:我们介绍了在圆柱空心阴极(CHC)直流磁控溅射中金属基底上的碳涂层的结果。这是一种通过再生烟discharge放电在CHC磁控溅射中制备非晶碳膜的新技术。碳膜在Ne气氛中沉积在Cu和Al基板上,并与He背景下80埃的石墨电极之间常规电弧放电产生的相同材料上的碳烟灰膜进行比较。使用在线发射,拉曼和傅立叶变换红外光谱对薄膜进行表征。 X射线衍射(XRD)和扫描电子显微镜(SEM)。拉曼光谱法从电弧放电中揭示了石墨和类金刚石结构的存在,而在CHC磁控溅射中,类石墨结构占主导。电弧放电的XRD图谱显示,铝样品的纳米范围内呈菱形和六边形Al4C3沉淀,铜中可能形成金刚石和六边形碳,而磁控溅射则得到非晶碳膜。表面的SEM图像显示了电弧放电中碳颗粒的疏松团聚体的聚集,而对于磁控管,溅射结构是规则的,边缘光滑且颗粒细小。

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